Through high-temperature thermal decomposition and controlled chemical reactions, the system enables the deposition of phosphosilicate glass (PSG) along with the precise diffusion and doping of phosphorus atoms. It is widely used for silicon wafer oxidation, phosphorus doping, poly-phosphorus doping, and other advanced semiconductor and solar cell processes. With uniform film formation and stable dopant control, the system ensures high- quality surfaces, optimized electrical properties, and enhanced performance for next-generation photovoltaic applications.