This equipment is designed for accurate removal of Phosphorus Silicon Glass (PSG) from photovoltaic solar cells, following the process flow: Water Film → HF → Rinse → Drying. It features a high-speed precision liquid-carrying etching roller to prevent under- or over-etching at wafer edges, along with precise water film control for complete coverage without dripping. Real-time solution conductivity monitoring ensures stable etching performance, while production at 4.5 m/min, low friction, and extended consumable life provide efficient, reliable, and consistent PSG removal for advanced solar cell manufacturing.