Trimethylaluminum (TMA) is a clear, colorless liquid with a low density of 0.74 g/ml, igniting spontaneously upon air exposure and reacting violently with water or alcohols. Highly miscible with aliphatic and aromatic hydrocarbons, it is a key metal-organic precursor in semiconductor and photovoltaic manufacturing. Widely used for Al₂O₃ passivation layers in PECVD/ALD and for depositing high-k dielectric films, TMA is essential for forming aluminum-based compound semiconductors such as AlN, AlP, AlGaAs, AlGaN, AlInGaP, and more through MOCVD processes.