This system is designed for the precise removal of LPCVD/PECVD deposited polysilicon from silicon wafers, following the process flow: Deposition Removal → Post-cleaning → Pickling → Post-cleaning. It supports MES, RFID, and optional online weighing, with one-key online washing and solution replacement for fast and easy fluid exchange. The adjustable process tank circulation volume and compatibility with additives from various brands ensure thorough deposition removal, complete cleaning, and consistent high-quality results, making it ideal for advanced solar cell manufacturing.